Symposium P
Advances in Nanofabrication & Applications
This symposium focuses on the most recent development of advanced nanofabrication technologies and novel materials development to tackle the resolution, accuracy, scalability, and throughput challenges. These technologies are key drivers to revolutionize the R&D landscape, spanning nanophotonics and nanoplasmonics, intelligent structures, sensing, materials engineering, etc. It aims to bring together leading scientists, researchers, engineers, and students to exchange and share their experiences and research achievements on all aspects of nanofabrication and nanomanufacturing. It also provides a premier interdisciplinary platform for participants to present and discuss the most recent innovations, technology trends, outlook, scientific and engineering challenges encountered, and solutions adopted in the fields.
• Polymeric nanostructures and thin films
• Advanced and unconventional nanofabrication
• 2D materials and van der Waals heterostructures
• 3D, 4D, free-form nanoprinting and direct laser writing
• Intelligent and functional materials for smart structures
• Extreme nanofabrications such as sub-10-nm nanofabrication
• Artificial intelligence and machine learning-assisted nanofabrication
• Scalable nanomanufacturing techniques such as nanoimprint lithography
• Applications in photonics, nano-optics, plasmonics, electronics, sensing, lighting and display, anti-counterfeiting, and emerging areas.
Information will be available soon!
Chair(s)
Liu Hong (IMRE, Singapore)
Co-Chair(s)
Liu Zheng (NTU, Singapore)
Rho Junsuk (Pohang Uni., South Korea)
Dong Zhaogang (IMRE, Singapore)
David J. Norris (ETH Zurich, Switzerland)
Scientific Advisor
Si-Young Choi (Pohang)
Correspondence
Yeng Ming Lam
Nanyang Technological University, Singapore
Email: ymlam@ntu.edu.sg